Gas type role on the dynamics of channel spark pulsed electron deposition system

Document Type : Original Article


1 Physics Department, Faculty of Science, Al-Azhar University, Cairo, Egypt

2 Department of Nuclear Engineering, Seoul National University, Seoul, Korea.

3 Spectroscopy Department, Physics Division, National Research Centre, 33 El Bohouth st. (fromer El Tahrir st.) P.O. 12622 Dokki – Giza – Egypt.

4 Physics Department, Faculty of Science, Al-Azhar Universitrt, Cairo, Egypt

5 Department of Physics Faculty of Science, Islamic University of Madinah, Medina, Saudi Arabia.


In this paper, the effect of feeding gas type on the dynamics of channel spark pulsed electron deposition system is investigated. Electrical, magnetic, and optical characterisations of the system were measured for different feeding gases, oxygen (O2), nitrogen (N2), and argon (Ar). The discharge current for each gas type was measured with maximum value of 1189 A for O2 at -13 kV applied voltage. The discharge current and voltage waveforms were simulated by LRC circuit theory. Effect of gas pressure on the maximum discharge current and total inductance was also investigated. The beam current investigated by faraday cup and reached maximum electron beam current of 136 A for O2 gas. Two magnetic pickup coils were employed for the measurements of beam kinetic dynamics and the measured beam speed was around 0.4× 106 m/sec. Electron beam plasma density was calculated from faraday cup and magnetic coils signals and found to be 1.96×1020 m-3. Optical emission spectra were also measured to identify reactive species and its role in electron beam interaction with graphite target for thin film deposition application. The ability of using the system for thin film deposition is demonstrated by depositing amorphous hydrogenated carbon (a-C:H) films over silicon substrates.


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